R. Fabian W. Pease served as a radar officer in the Royal Air Force from 1955 to 1957, and received his B.A., M.A., and Ph.D. degrees from Cambridge University in 1960, 1962, and 1964, respectively. His Ph.D. thesis was on High Resolution Scanning Electron Microscopy. After graduating, he was an Assistant Professor of Electrical Engineering at UC Berkeley for three years, where he continued his microscopy research. In 1967, Dr. Pease joined the technical staff of Bell Laboratories, where he first worked on digital television and later led a group that developed the processes for electron beam lithographic mask manufacture, and demonstrated a pioneering LSI circuit built with electron beam lithography.
Since 1978 he has been a Professor of Electrical Engineering at Stanford University. His group's areas of research include micro- and nano-fabrication and their application to electronic and magnetic devices and structures. This work has included the original demonstration of lithography with the scanning tunneling microscope, exploring the limits of resolution of deep ultraviolet lithography, the invention of the micro-channel heat sink and non-conventional electron beam technology for semiconductor manufacturing.
On sabbatical in 1993 and 1994, Dr. Pease conducted research on the synthesis of DNA microarrays at Affymetrix Corporation. From 1996 to 1998, he was assigned to the Defense Advanced Research Projects Agency, where he initiated programs in Advanced Microelectronics and in Molecular-Level Printing. He has served as a consultant to IBM, Xerox, Etec Systems, and Lawrence Livermore Labs and is on the Technical Advisory Boards of Ultratech Stepper, San Jose, CA and Affymetrix, Santa Clara, CA.
Dr. Pease was appointed the William E. Ayer Professor of Electrical Engineering in March 2001. He is a Fellow of the IEEE, and has served the IEEE in a variety of capacities. He is also a member of the National Academy of Engineering. With his student, David Tuckerman, he received the first IEEE Paul Rappaport Award. He was also the recipient of the IEEE Cledo Brunetti Award in 2001, for advancing high resolution patterning technologies, high performance thermal management, and scanning electron microscopy for microelectronics. Other honors include the Richard P. Feynman Prize for Microfabrication, which he shared with a student, Tom Newman, for writing a page of text in a 6 micron square with 25nm linewidths; and a Title A Fellowship from Trinity College, Cambridge. He has published over 200 articles and authored several book chapters.